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Home › Method of reducing carbon, sulphur, and oxygen impurities in a calcium-doped copper surface and semiconductor device thereby formed

Method of reducing carbon, sulphur, and oxygen impurities in a calcium-doped copper surface and semiconductor device thereby formed

US Patent 6444580 · Granted Sep 3, 2002

Estimated economic value: $1,843,000 ⓘ

Assignee

AMD

Inventors

Sergey Lopatin (138 patents)
Paul L. King (34 patents)
Joffre F. Bernard (17 patents)

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