Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Low thermal distortion Extreme-UV lithography reticle and method

Low thermal distortion Extreme-UV lithography reticle and method

US Patent 6395455 · Granted May 28, 2002

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Defect detection and classification based on attributes determined from a standa2018
Gas baffle and distributor for semiconductor processing chamber2010
Gas distribution showerhead featuring exhaust apertures2008
Fourier filters and wafer inspection systems2008
Low residual-stress brazed terminal for heater2004
Gas distribution showerhead2004
Particle removal apparatus2004
Low thermal distortion extreme-UV lithography reticle2002
Low thermal distortion extreme-UV lithography reticle2002
Crystal growth and annealing for minimized residual stress2002
Low thermal distortion extreme-UV lithography reticle2001
Low thermal distortion extreme-UV lithography reticle2001