Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Process apparatus and method for improved plasma processing of a substrate

Process apparatus and method for improved plasma processing of a substrate

US Patent 6395095 · Granted May 28, 2002

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Telescoping tool assembly and method for refurbishing welds of a core shroud of 2012
Small handling pole locking assembly2011
Small handling pole locking assembly2011
High pressure fourier transform infrared cell2010
Process apparatus and method for improving plasma production of an inductively c2007
High-pressure processing chamber for a semiconductor wafer2007
Plasma chamber wall segment temperature control2007
Control of fluid flow in the processing of an object with a fluid2007
Fluid-tight bell-and-spigot-joint for box culverts2006
High-pressure processing chamber for a semiconductor wafer2006
Apparatus and method for determining clamping status of semiconductor wafer2006
Vacuum-processing chamber-shield and multi-chamber pumping method2006