Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for a consistent shallow trench etch profile

Method for a consistent shallow trench etch profile

US Patent 6342428 · Granted Jan 29, 2002

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Charge trapping split gate embedded flash memory and associated methods2018
Line-edge roughness improvement for small pitches2016
Line-edge roughness improvement for small pitches2014
Self-aligned patterning method by using non-conformal film and etch for flash me2011
Use of a polymer spacer and Si trench in a bitline junction of a flash memory ce2011
Use of a polymer spacer and Si trench in a bitline junction of a flash memory ce2010
Self-aligned patterning method by using non-conformal film and etch back for fla2010
Thin film germanium diode with low reverse breakdown2008
Methods for designing grating structures for use in situ scatterometry to detect2008
Quantifying and predicting the impact of line edge roughness on device reliabili2008
Silicon-containing resist to pattern organic low k-dielectrics2007
Metal/oxide etch after polish to prevent bridging between adjacent features of a2007