Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Chemical mechanical polishing for forming a shallow trench isolation structure

Chemical mechanical polishing for forming a shallow trench isolation structure

US Patent 6169012 · Granted Jan 2, 2001

Estimated economic value: $2,026,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Regenerable nanoparticle for removing manganese and preparatory and use methods2025
Composite membrane comprising a decellularized amniotic membrane and a method fo2023
Method for manufacturing an optical sensor2022
High density plasma chemical vapor deposition process2011
High density plasma chemical vapor deposition process2011
High density plasma chemical vapor deposition process2010
High density plasma chemical vapor deposition process2010
High density plasma chemical vapor deposition process2009
Air gap for dual damascene applications2008
Dual damascene structure for the wiring-line structures of multi-level interconn2008
High density plasma chemical vapor deposition process2007
High density plasma chemical vapor deposition process2007