Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for high temperature etching of patterned layers using an organic mask stack

Method for high temperature etching of patterned layers using an organic mask stack

US Patent 6143476 · Granted Nov 7, 2000

Estimated economic value: $84,992,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Hybrid dynamic vision sensor and CMOS device for motion compensation2025
Non-permeable substrate carrier for electroplating2022
Thin film semiconductor material produced through reactive sputtering of zinc ta2020
Method of IGZO and ZnO TFT fabrication with PECVD SiO2 passivation2018
Methods and apparatuses for delaminating process pieces2017
Method of IGZO and ZNO TFT fabrication with PECVD SiO2 passivation2017
Maintainable substrate carrier for electroplating2016
Thin film semiconductors made through low temperature process2016
Buffer layers for metal oxide semiconductors for TFT2016
Non-permeable substrate carrier for electroplating2015
Thin film metal oxynitride semiconductors2015
TFT with insert in passivation layer or etch stop layer2015