Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Ion implantation control using charge collection, optical emission spectroscopy and mass analysis

Ion implantation control using charge collection, optical emission spectroscopy and mass analysis

US Patent 6101971 · Granted Aug 15, 2000

Estimated economic value: $45,196,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Widefield interferometric defocus-enhanced (WIDE) mid-infrared (MIR) phototherma2025
Active edge control of a crystalline sheet formed on the surface of a melt2025
Bond-selective intensity diffraction tomography and uses thereof2025
Wafer with regions of low oxygen concentration2025
Producing a ribbon or wafer with regions of low oxygen concentration2024
Compensated location specific processing apparatus and method2020
Method for controlling heat flow within a silicon melt using a heat diffusion ba2020
Method for achieving sustained anisotropic crystal growth on the surface of a si2020
Apparatus for forming crystalline sheet from a melt2020
Compensated location specific processing apparatus and method2019
Apparatus and method for controlling ion beam properties using energy filter2019
Apparatus for controlling heat flow within a silicon melt2019