Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Complementary material conditioning system for a chemical mechanical polishing machine

Complementary material conditioning system for a chemical mechanical polishing machine

US Patent 6022265 · Granted Feb 8, 2000

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Systems and methods for fuel cell gas circulation2021
Charge trapping split gate embedded flash memory and associated methods2018
Line-edge roughness improvement for small pitches2016
Nonvolatile resistive memory element with an oxygen-gettering layer2016
Stacked bi-layer as the low power switchable RRAM2016
Doped narrow band gap nitrides for embedded resistors of resistive random access2016
Current-limiting electrodes2015
Nanomaterial-reinforced resins and related materials2015
Nonvolatile resistive memory element with an oxygen-gettering layer2015
Resistive random access memory cells having doped current limiting layers2014
Line-edge roughness improvement for small pitches2014
Vertically stackable and retrofittable traffic cone linking2014