Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Inspection method and apparatus for the inspection of either random or repeating patterns

Inspection method and apparatus for the inspection of either random or repeating patterns

US Patent 6021214 · Granted Feb 1, 2000

Estimated economic value: $85,970,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method and system for mixed mode wafer inspection2022
Methodology of incorporating wafer physical measurement with digital simulation 2021
Prediction based chucking and lithography control optimization2020
Auto defect screening using adaptive machine learning in semiconductor device ma2020
Auto defect screening using adaptive machine learning in semiconductor device ma2019
Method of optimizing an optical parametric model for structural analysis using o2019
Method and system for mixed mode wafer inspection2019
Prediction based chucking and lithography control optimization2018
Detection of defects embedded in noise for inspection in semiconductor manufactu2018
System and method for discovering unknown problematic patterns in chip design la2017
EUV high throughput inspection system for defect detection on patterned EUV mask2016
Optimizing an optical parametric model for structural analysis using optical cri2016