Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Optimizing an optical parametric model for structural analysis using optical critical dimension (OCD) metrology

Optimizing an optical parametric model for structural analysis using optical critical dimension (OCD) metrology

US Patent 9310296 · Granted Apr 12, 2016

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Optical and X-ray metrology methods for patterned semiconductor structures with 2025
Forward library based seeding for efficient X-ray scatterometry measurements2025
Tunable DUV laser assembly2025
Methods and systems for measurement of semiconductor structures with multi-pass 2025
Electron gun and electron microscope2025
Full beam metrology for x-ray scatterometry systems2025
Full beam metrology for x-ray scatterometry systems2025
Method for entire removal of space truss and assistive support mechanism2025
Passivation of nonlinear optical crystals2024
Electrostatic discharge diode having dielectric isolation layer2024
Protective coating for nonlinear optical crystal2024
Battery assembly, electronic device, and battery detection system2024