Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Temperature control system for semiconductor process chamber

Temperature control system for semiconductor process chamber

US Patent 6015465 · Granted Jan 18, 2000

Estimated economic value: $101,937,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Substrate processing system, valve assembly, and processing method2020
Multi-station tool with wafer transfer microclimate systems2019
Method and apparatuses for operating and repairing nuclear reactors2018
Plasma processing chamber with a grounded electrode assembly2018
Plasma processing chamber with a grounded electrode assembly2015
Proximity head having a fluid resistor2014
Processing system with the dual end-effector handling2014
Multi-stage substrate cleaning method and apparatus2014
Confinement of foam delivered by a proximity head2014
Single substrate processing head for particle removal using low viscosity fluid2013
Methods and apparatuses for operating and repairing nuclear reactors2013
Method for using generator for foam to clean substrate2013