Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for using a hardmask to form an opening in a semiconductor substrate

Method for using a hardmask to form an opening in a semiconductor substrate

US Patent 6008123 · Granted Dec 28, 1999

Estimated economic value: $61,728,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Anti-rotation device for circular connector2020
Acoustic filtering circuitry including capacitor2019
Acoustic filtering circuitry including capacitor2019
Guided acoustic wave device2019
Cage for sensor, or the like2019
Surface acoustic wave filter with a cap layer for improved reliability2018
Cage for sensor, or the like2018
Methods, systems, and apparatuses for temperature compensated surface acoustic w2016
Acoustic wave device2015
Semiconductor device and a method of manufacture therefor2014
High coupling, low loss saw filter and associated method2013
High coupling, low loss saw filter and associated method2013