Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Plasma reactor with a deposition shield

Plasma reactor with a deposition shield

US Patent 6006694 · Granted Dec 28, 1999

Estimated economic value: $2,555,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Formation of a layer on a semiconductor substrate2018
Nanolayer deposition using bias power treatment2017
NanoLayer Deposition process for composite films2015
Dry etch stop process for eliminating electrical shorting in MRAM device structu2011
Dry etch stop process for eliminating electrical shorting in MRAM device structu2010
Reactor with heated and textured electrodes and surfaces2008
Plasma etch reactor and method2007
System and method for processing a wafer including stop-on-aluminum processing2007
Method for using a hard mask for critical dimension growth containment2005
Method for using a hard mask for critical dimension growth containment2005
Plasma etch reactor and method2005
Method for minimizing the critical dimension growth of a feature on a semiconduc2004