Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Silane etching process

Silane etching process

US Patent 5965463 · Granted Oct 12, 1999

Estimated economic value: $64,159,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Semiconductor processing system2024
Plasma reactor for ultra-high aspect ratio etching and etching method thereof2021
Method and apparatus for processing semiconductor work pieces2018
Capacitive-coupled plasma processing apparatus and method for processing substra2016
Multi-station decoupled reactive ion etch chamber2015
Multi-station decoupled reactive ion etch chamber2013
Multi-station plasma reactor with multiple plasma regions2012
Capacitive CVD reactor and methods for plasma CVD process2012
Silicon carbide gas distribution plate and RF electrode for plasma etch chamber2011
Gas distribution assembly for use in a semiconductor work piece processing react2010
Multiple frequency plasma chamber, switchable RF system, and processes using sam2009
Integrated low k dielectrics and etch stops2007