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Home › Unique .alpha.-C:N:H/.alpha.-C:N.sub.x film liner/barrier to prevent fluorine outdiffusion from .alpha.-FC chemical vapor deposition dielectric layers

Unique .alpha.-C:N:H/.alpha.-C:N.sub.x film liner/barrier to prevent fluorine outdiffusion from .alpha.-FC chemical vapor deposition dielectric layers

US Patent 5946601 · Granted Aug 31, 1999

Estimated economic value: $176,323,000 ⓘ

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