Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method and apparatus for run-time correction of proximity effects in pattern generation

Method and apparatus for run-time correction of proximity effects in pattern generation

US Patent 5847959 · Granted Dec 8, 1998

Estimated economic value: $15,598,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Device and method for high precision fiber-optic temperature profile measurement2018
Method for high-resolution processing of thin layers using electron beams2010
Method of exposing a target to a charged particle beam2005
Positioning device2005
Method of reducing heat-induced distortion of photomasks during lithography2005
Technique for writing with a raster scanned beam2004
Apparatus and methods for secondary electron emission microscope with dual beam2004
Immersion lens with magnetic shield for charged particle beam system2004
Hydrodealkylation processes2004
Real-time prediction of and correction of proximity resist heating in raster sca2004
Real-time prediction of and correction of proximity resist heating in raster sca2004
Real-time prediction of and correction of proximity resist heating in raster sca2004