Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method and apparatus for measuring substrate temperatures

Method and apparatus for measuring substrate temperatures

US Patent 5755511 · Granted May 26, 1998

Estimated economic value: $31,043,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Annealing apparatus using two wavelengths of radiation2024
Annealing apparatus using two wavelengths of radiation2020
Method of thermal processing structures formed on a substrate2020
Method of thermal processing structures formed on a substrate2018
Annealing apparatus using two wavelengths of radiation2017
Thermal processing by scanning a laser line beam2017
Single-chamber sequential curing of semiconductor wafers2015
Annealing apparatus using two wavelengths of laser radiation2014
Annealing apparatus using two wavelengths of continuous wave laser radiation2014
Scanned laser light source2014
Annealing apparatus using two wavelengths of continuous wave laser radiation2014
Annealing apparatus using two wavelengths of continuous wave laser radiation2014