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Home › Ellipsometer/polarimeter based process monitor and control system suitable for simultaneous retrofit on molecular beam epitaxy system RHEED/LEED interface system, and method of use

Ellipsometer/polarimeter based process monitor and control system suitable for simultaneous retrofit on molecular beam epitaxy system RHEED/LEED interface system, and method of use

US Patent 5582646 · Granted Dec 10, 1996

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