Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Plasma processing apparatus and method

Plasma processing apparatus and method

US Patent 5578164 · Granted Nov 26, 1996

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Etching method, and recording medium2016
Etching of silicon oxide film2015
Substrate processing method and system2015
Substrate processing apparatus2015
Substrate processing method and substrate processing apparatus2015
Magnetic field generator for magnetron plasma, and plasma etching apparatus and 2011
Etching system and etching chamber2003
Method for feeding gases for use in semiconductor manufacturing2002
Apparatus for feeding gases for use in semiconductor manufacturing2001
Magnetron plasma processing apparatus2001
Plasma processing method and plasma processing apparatus2000
Plasma processing apparatus1998