Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method and apparatus for the deposition of parylene AF4 onto semiconductor wafers

Method and apparatus for the deposition of parylene AF4 onto semiconductor wafers

US Patent 5538758 · Granted Jul 23, 1996

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Tree spade for ATV2009
Internally heated pyrolysis zone2000
Internally heated pyrolysis zone2000
Internally heated pyrolysis zone2000
Continuous vapor deposition apparatus1999
Parylene polymer layers1999
Parylene polymer layers1999
Parylene polymer layers1999
Method and apparatus for cryogenically cooling a deposition chamber1998
Method and apparatus for cryogenically cooling a deposition chamber1998
Method and apparatus for cryogenically cooling a deposition chamber1998
Parylene deposition apparatus including a heated and cooled dimer crucible1998