Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Positive photoresist composition containing photoacid generator and use thereof

Positive photoresist composition containing photoacid generator and use thereof

US Patent 5498765 · Granted Mar 12, 1996

Estimated economic value: $19,192,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Semiconductor device having galvanic isolation and method therefor2025
Method and system for determining initial contact control values for shaping par2025
Radio frequency packages containing multilevel power substrates and associated f2024
Tie bar removal for semiconductor device packaging2024
Method and apparatus to reduce variation of physical attribute of droplets using2024
Fluid droplet methodology and apparatus for imprint lithography2023
Method of determining the initial contact point for partial fields and method of2023
Semiconductor device package having galvanic isolation and method therefor2022
Semiconductor device package having galvanic isolation and method therefor2022
Tie bar removal for semiconductor device packaging2022
Residual layer thickness compensation in nano-fabrication by modified drop patte2022
Methods of generating drop patterns, systems for shaping films with the drop pat2021