Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Plasma processing apparatus employing a textured focus ring

Plasma processing apparatus employing a textured focus ring

US Patent 5474649 · Granted Dec 12, 1995

Estimated economic value: $45,445,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Ground bar and method of grounding2022
Ground bar2020
Process kit erosion and service life prediction2020
Process kit erosion and service life prediction2019
Contaminant reduction improvements for plasma etch chambers1998
Contaminant reduction improvements for plasma etch chambers1998
Contaminant reduction improvements for plasma etch chambers1998
Contaminant reduction improvements for plasma etch chambers1997
Contaminant reduction improvements for plasma etch chambers1997
Contaminant reduction improvements for plasma etch chambers1997
Quick release process kit1996
Quick release process kit1996