Photosensitive resin composition for forming polyimide film pattern comprising an o-quinone diazide photosensitive agent

Assignee

• Kabushiki Kaisha Toshiba

Inventors

• Masayuki Oba (17 patents)
• Rumiko Hayase (29 patents)
• Naoko Kihara (45 patents)
• Shuzi Hayase (46 patents)
• Yukihiro Mikogami (14 patents)
• Yoshihiko Nakano (96 patents)
• Naohiko Oyasato (10 patents)
• Shigeru Matake (27 patents)
• Kei Takano (9 patents)

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