Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Crosslinkable aqueous developable photoresist compositions and method for use thereof

Crosslinkable aqueous developable photoresist compositions and method for use thereof

US Patent 5296332 · Granted Mar 22, 1994

Estimated economic value: $7,732,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Forming multiple aerial images in a single lithography exposure pass2024
Method and apparatus for imaging using narrowed bandwidth2023
Forming multiple aerial images in a single lithography exposure pass2022
Mitigation of hot carrier damage in field-effect transistors2020
Optimization of source and bandwidth for new and existing patterning devices2019
Wafer-based light source parameter control2019
Control of a spectral feature of a pulsed light beam2018
Wafer-based light source parameter control2018
Controlling for wafer stage vibration2017
Exposure photolithography methods2016
Integrated circuit with degradation monitoring2016
Developable bottom antireflective coating composition and pattern forming method2015