Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method of forming oxide layers by bias ECR plasma deposition

Method of forming oxide layers by bias ECR plasma deposition

US Patent 5124014 · Granted Jun 23, 1992

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Apparatus having a layer of material configured as a reservoir having an interio2010
Process for manufacturing an apparatus that protects features during the removal2008
Light-mediated micro-chemical reactors2008
Wafer-based ion traps2006
Mass spectrometers on wafer-substrates2005
Method of making an integrated circuit inductor wherein a plurality of apertures2005
Apparatus and process for bulk wet etch with leakage protection2005
Semiconductor device having a low dielectric constant dielectric material and pr2005
Micro-relay2004
Method for reducing dishing in chemical mechanical polishing2003
RF LDMOS on partial SOI substrate2003
Stacked LDD high frequency LDMOSFET2003