Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method of forming resist pattern and thermally stable and highly resolved resist pattern

Method of forming resist pattern and thermally stable and highly resolved resist pattern

US Patent 4996122 · Granted Feb 26, 1991

Estimated economic value: $6,373,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Coating systems and formulations with high hide and holdout2019
Paint2013
Yield improvement for Josephson junction test device formation2012
Photoimageable compositions having improved flexibility and stripping ability2001
Photoimageable compositions having improved flexibility and stripping ability2001
Photoimageable compositions having improved chemical resistance and stripping ab2000
Antireflective coating material for photoresists2000
Traffic stripe composition2000
Photoimageable compositions having improved chemical resistance and stripping ab2000
Photoimageable compositions having improved chemical resistance and stripping ab2000
Fractionation of phenol formaldehyde condensate and photoresist compositions pro1999
Fractionated novolak resin copolymer and photoresist composition therefrom1999