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Home › PECVD (plasma enhanced chemical vapor deposition) method for depositing of tungsten or layers containing tungsten by in situ formation of tungsten fluorides

PECVD (plasma enhanced chemical vapor deposition) method for depositing of tungsten or layers containing tungsten by in situ formation of tungsten fluorides

US Patent 4969415 · Granted Nov 13, 1990

Estimated economic value: $12,818,000 ⓘ

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