Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Cleaning system for removing deposits from pump in an exhaust of a substrate processing system

Cleaning system for removing deposits from pump in an exhaust of a substrate processing system

US Patent 12394608 · Granted Aug 19, 2025

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Backside reactive inhibition gas2025
Backside reactive inhibition gas2025
Reducing line bending during metal fill process2025
Tungsten feature fill with nucleation inhibition2025
Tungsten feature fill with nucleation inhibition2025
Tungsten feature fill with inhibition control2025
Tungsten feature fill with inhibition control2025
Ex situ coating of chamber components for semiconductor processing2025
Ex situ coating of chamber components for semiconductor processing2025
Ex situ coating of chamber components for semiconductor processing2025
Ex situ coating of chamber components for semiconductor processing2025
Reducing line bending during metal fill process2024