Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Semiconductor device with silicide structures surrounding epitaxial structures and method of making the same

Semiconductor device with silicide structures surrounding epitaxial structures and method of making the same

US Patent 12376321 · Granted Jul 29, 2025

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Wafer bonding method and semiconductor structure obtained by the same2025
Dual silicide layers in semiconductor devices2025
Metal nanoparticles in an amorphous bonding layer between a device substrate and2025
Seam-top seal for dielectrics2025
Conductive structure interconnects with downward projections2025
Semiconductor device and method for manufacturing the same2025
Semiconductor device with conductive liners over silicide structures and method 2025
Contact and via structures for semiconductor devices2025
Bilayer seal material for air gaps in semiconductor devices2025
Bilayer seal material for air gaps in semiconductor devices2025
Bilayer seal material for air gaps in semiconductor devices2025
Semiconductor device structure and method for forming the same2025