Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method of forming optical proximity correction model and method of fabricating semiconductor device using the same

Method of forming optical proximity correction model and method of fabricating semiconductor device using the same

US Patent 12354920 · Granted Jul 8, 2025

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Electronic apparatus and controlling method thereof2025
Electronic device including processor executing defect detection module, operati2025
Electronic device including processor executing defect detection module, operati2025
Computing device for predicting a profile using deep learning and operating meth2025
Method, electronic device and operating method of electronic device and manufact2025
Defect detection method of deep learning-based semiconductor device and semicond2025
Device and method for detecting defects on wafer2024
Semiconductor device manufacturing method and extreme ultraviolet mask manufactu2024
Pattern analysis system and method of manufacturing semiconductor device using t2024
Process proximity correction method and the computing device for the same2023
Methods for optical proximity correction and methods of fabricating semiconducto2022
Optical proximity correction (OPC) modeling methods and methods for manufacturin2021