Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Pattern analysis system and method of manufacturing semiconductor device using the same

Pattern analysis system and method of manufacturing semiconductor device using the same

US Patent 12062164 · Granted Aug 13, 2024

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Electronic device including processor executing defect detection module, operati2025
Method of forming optical proximity correction model and method of fabricating s2025
Method, electronic device and operating method of electronic device and manufact2025
Device and method for detecting defects on wafer2024
Process proximity correction method and the computing device for the same2023
Method for operating application providing group call service using mobile voice2018
Method and apparatus for storing data in mobile terminal2017
System for producing heat source for heating or electricity using medium/low tem2017
Method of authenticating user, server and mobile terminal performing the same2016
Mobile communication terminal for providing radio frequency identification servi2015
Semiconductor device and method for fabricating the same2015
Semiconductor device and method for fabricating the same2014