Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › In-situ defect count detection in post chemical mechanical polishing

In-situ defect count detection in post chemical mechanical polishing

US Patent 12347735 · Granted Jul 1, 2025

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Chemical-mechanical planarization pad and methods of use2025
Conductive structure interconnects with downward projections2025
Semiconductor device with tunable threshold voltage and method for manufacturing2025
Method for forming a contact plug by bottom-up metal growth2025
Fabrication of field effect transistors with ferroelectric materials2025
Gate structures in semiconductor devices2025
Semiconductor structure2025
Semiconductor device structure including dielectric region with plurality of dif2025
Composition and method for polishing and integrated circuit2025
Composition and method for polishing and integrated circuit2025
Bevel edge removal methods, tools, and systems2025
Isolation structures of semiconductor devices2025