Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Semiconductor device having isolation structure formed of low-k dielectric material and method for forming the same

Semiconductor device having isolation structure formed of low-k dielectric material and method for forming the same

US Patent 12336235 · Granted Jun 17, 2025

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Isolation structure for semiconductor device2025
Isolation structure for semiconductor device2025
Context-based remote autonomous vehicle assistance2025
Metal features of a semiconductor device and methods for forming the same2025
Metal features of a semiconductor device and methods for forming the same2025
Power semiconductor device2025
Interconnect structures with conductive carbon layers2025
Semiconductor device and operating method thereof2025
Static random-access memory (SRAM) device and related SRAM-based compute-in-memo2025
Fin shaping and integrated circuit structures resulting therefrom2025
Isolation structures in semiconductor devices2025
Method of manufacturing phase shift photo masks2025