Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Cooling flow in substrate processing according to predicted cooling parameters

Cooling flow in substrate processing according to predicted cooling parameters

US Patent 12326282 · Granted Jun 10, 2025

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Movable central reflectors of semiconductor processing equipment, and related sy2025
Mechatronic spatial atomic layer deposition system with closed-loop feedback con2025
Methods of correlating zones of processing chambers, and related systems and met2025
Process kits and related methods for processing chambers to facilitate depositio2025
Methods for detection using optical emission spectroscopy2025
Eco-efficiency (sustainability) dashboard for semiconductor manufacturing2025
Eco-efficiency (sustainability) dashboard for semiconductor manufacturing2025
Eco-efficiency (sustainability) dashboard for semiconductor manufacturing2025
Eco-efficiency (sustainability) dashboard for semiconductor manufacturing2025
Eco-efficiency (sustainability) dashboard for semiconductor manufacturing2025
High conductance divert line architecture2025
Flow guide structures and heat shield structures, and related methods, for depos2025