Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method of making a three-dimensional memory device using composite hard masks for formation of deep via openings

Method of making a three-dimensional memory device using composite hard masks for formation of deep via openings

US Patent 12261080 · Granted Mar 25, 2025

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method of making high aspect ratio openings in a semiconductor device using ion 2025
Three-dimensional memory device including composite backside metal fill structur2025
Three-dimensional memory device including composite backside metal fill structur2025
Three-dimensional memory device and method of making thereof by non-conformal se2025
Three-dimensional memory device and method of making thereof by non-conformal se2025
Three-dimensional memory device and method of making thereof by non-conformal se2025
Three-dimensional memory device and method of making thereof by non-conformal se2025
Three-dimensional memory device and method of making thereof by non-conformal se2025
Growth of thin oxide layer with silicon nitride and conversion2025
Three-dimensional memory device containing engineered charge storage elements an2025
Three-dimensional memory device containing engineered charge storage elements an2025
Three-dimensional memory device containing engineered charge storage elements an2025