Apparatus for physical vapor deposition and method for forming a layer

Assignee

• TSMC

Inventors

• Hsin-Liang Chen (44 patents)
• Wen-Chih Wang (18 patents)
• Chia-Hung Liao (23 patents)
• Cheng-Chieh Chen (15 patents)
• Yi-Ming Yeh (2 patents)
• Hung-Ting Lin (6 patents)
• Yung-Yao Lee (61 patents)

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