Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Semiconductor processing apparatus and a method for processing a substrate

Semiconductor processing apparatus and a method for processing a substrate

US Patent 12018365 · Granted Jun 25, 2024

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Showerhead assembly and components thereof2025
Manifolds for uniform vapor deposition2025
Methods and systems for forming a layer comprising aluminum, titanium, and carbo2025
Methods and systems for delivery of vanadium compounds2025
Refillable large volume solid precursor sublimation vessel2025
Constant headspace ampoule2025
Methods of forming structures including vanadium boride and vanadium phosphide l2025
Titanium aluminum and tantalum aluminum thin films2025
Methods for forming a semiconductor device structure and related semiconductor d2024
Deposition of oxide thin films2024
Method of forming chromium nitride layer and structure including the chromium ni2024
Bottom fed sublimation bed for high saturation efficiency in semiconductor appli2024