Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Atomic layer deposition of metal films

Atomic layer deposition of metal films

US Patent 11970776 · Granted Apr 30, 2024

Estimated economic value: $255,527,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Integration of dry development and etch processes for EUV patterning in a single2025
Method for preventing line bending during metal fill process2025
Method for preventing line bending during metal fill process2025
Deposition of films using molybdenum precursors2025
Deposition of films using molybdenum precursors2025
Deposition of films using molybdenum precursors2025
Deposition of films using molybdenum precursors2025
Deposition of films using molybdenum precursors2025
Systems and methods for homogenous intermixing of precursors in alloy atomic lay2025
Molybdenum deposition2025
Molybdenum fill2025
Molybdenum fill2025