Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Substrate process endpoint detection using machine learning

Substrate process endpoint detection using machine learning

US Patent 11901203 · Granted Feb 13, 2024

Estimated economic value: $47,589,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

In-situ reflectometry for real-time process control2025
Hyper-spectral multi-spot optical reflectometer2025
Endpoint detection system for enhanced spectral data collection2025
Endpoint detection system for enhanced spectral data collection2025
Total or local thickness variation for optical devices2025
System and method to map thickness variations of substrates in manufacturing sys2025
Autonomous substrate processing system2025
Autonomous substrate processing system2025
Autonomous substrate processing system2025
Methods and mechanisms for preventing fluctuation in machine-learning model perf2025
Methods and mechanisms for generating virtual knobs for model performance tuning2025
Methods and mechanisms for generating virtual knobs for model performance tuning2025