Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Cyclic self-limiting etch process

Cyclic self-limiting etch process

US Patent 11791167 · Granted Oct 17, 2023

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Apparatus and method for wafer alignment2025
Method for chuck compensation via wafer shape control2025
In-situ lithography pattern enhancement with localized stress treatment tuning u2025
Method of adjusting wafer shape using multi-directional actuation films2025
Hybrid patterning-bonding semiconductor tool2025
3D multiple location compressing bonded arm for advanced integration2025
Wafer shape control for W2W bonding2025
Replacement buried power rail in backside power delivery2025
System for backside deposition of a substrate2025
Data collection apparatus of power system2024
Method of patterning a substrate using a sidewall spacer etch mask2024
Precision multi-axis photolithography alignment correction using stressor film2024