Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Plasma enhanced deposition processes for controlled formation of oxygen containing thin films

Plasma enhanced deposition processes for controlled formation of oxygen containing thin films

US Patent 11776807 · Granted Oct 3, 2023

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Selective passivation and selective deposition2025
Selective deposition of organic material2025
Multiple-layer method and system for forming material within a gap2025
Method and apparatus for forming a patterned structure on a substrate2025
Methods and systems for filling a gap2025
Etch process and a processing assembly2025
Germanium tin oxide-containing semiconductor device and methods for forming the 2025
Thermal atomic layer etching processes2025
Selective passivation and selective deposition2025
Thermal atomic layer etching processes2025
Method for forming semiconductor device with transistors on opposite sides of a 2025
Deposition of organic films2025