Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Suppression of parasitic deposition in a substrate processing system by suppressing precursor flow and plasma outside of substrate region

Suppression of parasitic deposition in a substrate processing system by suppressing precursor flow and plasma outside of substrate region

US Patent 11725282 · Granted Aug 15, 2023

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Process module chamber providing symmetric RF return path2025
Multi-scale system for projection micro stereolithography2025
System and method of low-waste multi-material resin printing2025
Multiple-output radiofrequency matching module and associated methods2025
Impedance transformation in radio-frequency-assisted plasma generation2025
Guiding device and associated system2025
Common terminal heater for ceramic pedestals used in semiconductor for fabricati2025
In situ protective coating of chamber components for semiconductor processing2025
Lamellar ceramic structure2025
Anomalous plasma event detection and mitigation in semiconductor processing2025
Dual zone heaters for metallic pedestals2025
Mechanical indexer for multi-station process module2025