Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Chamber processes for reducing backside particles

Chamber processes for reducing backside particles

US Patent 11702738 · Granted Jul 18, 2023

Estimated economic value: $58,990,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Integrated cleaning process for substrate etching2025
Integrated cleaning process for substrate etching2022
Method of enhanced selectivity of hard mask using plasma treatments2019
Methods of non-destructive post tungsten etch residue removal2019
Method and apparatus for rapid pump-down of a high-vacuum loadlock2018
Substrate placement detection in semiconductor equipment using thermal response 2018
Systems and methods for inhibiting oxide growth in substrate handler vacuum cham2016
Closed loop monitoring of electroplating bath constituents using mass spectromet2004
Capillary tube assembly with replaceable capillary tube2003
Passivation of copper in dual damascene metalization2003
Apparatus and method for enhanced degassing of semiconductor wafers for increase2002
Linear multipole rod assembly for mass spectrometers2002