Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Closed loop monitoring of electroplating bath constituents using mass spectrometry

Closed loop monitoring of electroplating bath constituents using mass spectrometry

US Patent 6726824 · Granted Apr 27, 2004

Estimated economic value: $41,297,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Chamber processes for reducing backside particles2023
Method and apparatus for rapid pump-down of a high-vacuum loadlock2018
Systems and methods for inhibiting oxide growth in substrate handler vacuum cham2016
Capillary tube assembly with replaceable capillary tube2003
Passivation of copper in dual damascene metalization2003
Apparatus and method for enhanced degassing of semiconductor wafers for increase2002
Linear multipole rod assembly for mass spectrometers2002
Method of cleansing vias in semiconductor wafer having metal conductive layer2001
Filament assembly for mass spectrometer ion sources1996