Extended acid etch for oxide removal

Assignee

• TSMC

Inventors

• Hong-Ta Kuo (3 patents)
• I-Shi Wang (31 patents)
• Tzu-Ping Yang (10 patents)
• Hsing-Yu Wang (2 patents)
• Shu-Han CHAO (3 patents)
• Hsi-Cheng Hsu (31 patents)
• Yin-Tun Chou (12 patents)
• Yuan-Hsin Chi (14 patents)
• Sheng Lin (79 patents)

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