Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Electrodynamic mass analysis with RF biased ion source

Electrodynamic mass analysis with RF biased ion source

US Patent 11587778 · Granted Feb 21, 2023

Estimated economic value: $24,540,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Shadow mask apparatus and methods for variable etch depths2025
Particle accelerator having novel electrode configuration for quadrupole focusin2025
Model-based controlled load lock pumping scheme2025
Linear accelerator assembly including flexible high-voltage connection2025
Plasma shaper to control ion flux distribution of plasma source2025
Plasma shaper to control ion flux distribution of plasma source2025
Ribbon beam plasma enhanced chemical vapor deposition system for anisotropic dep2025
Device to control uniformity of extracted ion beam2024
Device to control uniformity of extracted ion beam2024
Single-slot tubular cathode2024
Single-slot tubular cathode2024
Resonator, linear accelerator configuration and ion implantation system having r2024