Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Systems and methods for combined reflectometry and photoelectron spectroscopy

Systems and methods for combined reflectometry and photoelectron spectroscopy

US Patent 11536674 · Granted Dec 27, 2022

Estimated economic value: $412,706,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Massive overlay metrology sampling with multiple measurement columns2025
Device feature specific edge placement error (EPE)2024
Soft x-ray optics with improved filtering2024
Methods and systems for targeted monitoring of semiconductor measurement quality2024
Methods and systems for combining x-ray metrology data sets to improve parameter2024
Optical metrology tool equipped with modulated illumination sources2024
Massive overlay metrology sampling with multiple measurement columns2024
Laser-sustained plasma lamps with graded concentration of hydroxyl radical2024
Self-calibrating overlay metrology2024
Self-calibrating overlay metrology2024
Bandgap measurements of patterned film stacks using spectroscopic metrology2023
Bandgap measurements of patterned film stacks using spectroscopic metrology2023