Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Selective deposition of conductive cap for fully-aligned-via (FAV)

Selective deposition of conductive cap for fully-aligned-via (FAV)

US Patent 11515203 · Granted Nov 29, 2022

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Extreme ultraviolet lithography patterning method2025
Patterning features with metal based resists2025
Metal hard mask integration2025
Method of conductive material deposition2025
Coaxial filter and communication radio frequency device2025
Visual and audio multimodal searching system2025
Variable hardness amorphous carbon mask2025
Method for patterning a substrate using photolithography2025
Multimodal query prediction2025
Pitch scaling in microfabrication2025
Pre-etch treatment for metal etch2025
Method for reducing lithography defects and pattern transfer2025