Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Using a same mask for direct print and self-aligned double patterning of nanosheets

Using a same mask for direct print and self-aligned double patterning of nanosheets

US Patent 11257681 · Granted Feb 22, 2022

Estimated economic value: $13,349,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Buried power rail at tight cell-to-cell space2025
Structure containing a via-to-buried power rail contact structure or a via-to-ba2025
Structure containing a via-to-buried power rail contact structure or a via-to-ba2025
Metal lines with low via-to-via spacing2025
Air gap spacer for metal gates2025
Stacked transistor layout for improved cell height scaling2025
Integrated circuit having vertical routing to bond pads2025
Semiconductor backside transistor integration with backside power delivery netwo2025
Physical unclonable function2025
Alternating hardmasks for tight-pitch line formation2025
Bottom contact for stacked GAA FET2025
Indium electroplating on physical vapor deposition tantalum2025