Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Matchless plasma source for semiconductor wafer fabrication

Matchless plasma source for semiconductor wafer fabrication

US Patent 11224116 · Granted Jan 11, 2022

Estimated economic value: $820,039,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Matchless plasma source for semiconductor wafer fabrication2025
Pulsing RF coils of a plasma chamber in reverse synchronization2025
Matchless plasma source for semiconductor wafer fabrication2025
Robust dispatch method for flexibility resources of large-scale data center micr2025
Symmetric coupling of coil to direct-drive radiofrequency power supplies2025
Matchless plasma source for semiconductor wafer fabrication2025
Matchless plasma source for semiconductor wafer fabrication2025
RF pulsing within pulsing for semiconductor RF plasma processing2025
RF pulsing within pulsing for semiconductor RF plasma processing2025
RF pulsing within pulsing for semiconductor RF plasma processing2025
Plasma processing apparatus2025
Substrate location detection and adjustment2025